Product Sheets

Thank you for your interest in GT Advanced Technologies products and services. Below is a collection of our product sheets. For further information about our products and services contact a GT Advanced Technologies representative.

Sapphire

ASF®115 (235.18 KB)
Proven Technology for a Growing Market Opportunity - The demand for high-quality sapphire material is expected to grow as the LED industry expands—driven by new applications such as high brightness
(HB) LEDs for commercial and residential lighting.

Power Electronics

SiClone™100 (320.26 KB)
Silicon Carbide Sublimation Furnace - Enabling Growth of the Power Electronics Market
Leveraging its deep expertise in crystal growth technologies, GT Advanced Technologies has developed a silicon carbide sublimation furnace to address the growing needs of the power electronics industry. Backed by GT’s extensive global supply chain, sales and service network, and over 40+ years of crystal growth technology, the SiClone™ sublimation furnace is a leading platform that can easily scale with our customer’s needs.

Polysilicon

SDR™1K CVD Reactors (232.01 KB)
GT Advanced Technologies’ SDRTM1K is the most advanced commerciallyavailable SDR from GT’s industry-leading family of CVD reactors –recognized as a proven solution for manufacturing the lowest cost andhighest quality polysilicon.
SDR™600 CVD Reactor (230.94 KB)
Reliability and Repeatability for High-Volume Manufacturing
GT Advanced Technologies chemical vapor deposition (CVD) reactors are proven, fast-rate production chambers that use the popular Siemens-type process technology to manufacture solar grade or higher-purity electronic grade polysilicon. The SDR™600 offers reliability and repeatability in a lowmaintenance process platform, desirable for high-volume manufacturing. Production capacity for the SDR600 reactor is greater than 600 MTA.
Gen 2 CVD Reactor E-Upgrade (248.79 KB)
GT Advanced Technologies offers a next-generation CVD E-Upgrade package that can integrate with GT’s own SDR™ CVD reactors, as well as many other CVD reactor brands. The Gen 2 CVD Reactor E-Upgrade solution will increase both the throughput of each CVD reactor by 20-40% as well as lower electricity consumption by 25-40%, resulting in a payback time of less than one year for most polysilicon producers.
HYDROCHLORINATION TECHNOLOGY SOLUTION (258.88 KB)
High Volume Gains from Single FBR System Substantially Reduces Capital Investment Costs vs. Dual FBR Approach - GT Advanced Technologies offers a high volume hydrochlorination solution capable of producing enough trichlorosilane (TCS) from a single hydrochlorination fluid bed reactor (FBR) system to support a 12,500 MTA polysilicon facility.
Polysilicon Processing System (255.26 KB)
GT Advanced Technologies’ polysilicon processing system is a complete solution designed to minimize product contamination in all activities from the chemical vapor deposition (CVD) reactor harvest to final product packaging. GT’s polysilicon processing system includes all the engineering technology and equipment necessary to harvest, transport, process, and package the polysilicon rods produced in GT’s SDR series CVD reactors.
GENERATION 2 CONVERTER (248.79 KB)
Reliability and Repeatability for High-Volume Manufacturing
GT Advanced Technologies’ second-generation converter is unique to the market, as this is the first commercially available converter designed specifically to hydrogenate silicon tetrachloride (STC) to trichlorosilane (TCS). Hydrogenating the STC by-product to TCS is essential, since STC is a byproduct generated during the polysilicon production process. For polysilicon producers seeking to optimize an existing direct chlorination facility, the Generation 2 Converter is the ideal solution.
SILANE PRODUCTION (293.22 KB)
Supplying Basic Engineering Packages for Ultra-Pure Silane Production
The production technology package offered by GT Advanced Technologies to produce silane, results in ultra-pure gas that can be sold on the merchant market or used for the production of electronics-grade polysilicon or consumed in thin-film applications.
TCS Production Technology Solution (286.07 KB)
GT Advanced Technologies offers a complete TCS production technology package that uses hydrochlorination technology to improve the efficiency and lower costs of polysilicon production. Producing TCS via hydrochlorination technology reduces capital investment by 10 to 15 percent and lowers annual operating costs by about 15 percent.
Advanced Thermal Heating (ATH) System (247.7 KB)
Thermal Heating (ATH) System generates the optimal temperature within a hydrochlorination fluid bed reactor (FBR) by heating the process gas prior to FBR entry. The ATH system is extremely flexible and can be designed to easily integrate into a customer’s existing hydrochlorination operation helping to debottleneck the TCS production process or it can be designed to completely replace the existing electrical heaters in construction of a new hydrochlorination facility. GT’s ATH system incorporates several novel design enhancements of the vessel and internal components that offer a significant upgrade in reliability and on-line time over traditional in-line heaters.
PROCESS AND PRODUCT ANALYTICAL TECHNIQUES (292.48 KB)
Analyses Available from Raw Materials to Final Product
When operating a polysilicon plant for the solar or semiconductor industries it is important to have an understanding of the quality of the polysilicon being produced. Statistical process control methods and quality assurance measures can only be used if there are established and reliable methods for measuring the process.

Photovoltaic

DSS™20M (303.75 KB)
The GT Advanced Technologies DSS™ 20M is the newest member of the industry leading family of DSS crystallization systems. The DSS20M sets a new standard for cost-effective, precisely controlled crystalline ingot growth and helps customers achieve lower cost of ownership and better ingot quality. The DSS20M can grow significantly larger silicon ingots resulting in ~100% more output than the previous generation, DSS™850, while reducing consumable costs and optimizing the wafer-slicing process. The DSS20M also produces more than twice the amount of high grade wafers than the DSS850. In short, GT Advanced Technologies is committed to delivering sustained value to customers and the DSS20M delivers on this promise.
DSS™850 Crystalline Growth System (682.43 KB)
Increased Throughput Improves Productivity by 65 Percent
The GT Advanced Technologies DSS™ 850 is the newest member of the industry’s leading family of DSS crystallization systems. The DSS850 sets a new standard for cost-effective, precisely controlled crystalline ingot growth and helps customers achieve lower cost of ownership and better ingot quality. The DSS850 can grow significantly larger silicon ingots averaging 800 kg resulting in 65 percent more output, while reducing consumable costs and optimizing the wafer- slicing process. The design of the DSS850 will support
MonoCast™ crystal growth that offers a path to higher quality material.

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