DSS™20M Crystalline Growth System

The Next Generation of Multicrystalline Growth EquipmentDSS 20M

The GT Advanced Technologies DSS™ 20M is the newest member of the industry leading family of DSS crystallization systems. The DSS20M sets a new standard for cost-effective, precisely controlled crystalline ingot growth and helps customers achieve lower cost of ownership and better ingot quality. The DSS20M can grow significantly larger silicon ingots resulting in ~100% more output than the previous generation, DSS850, while reducing consumable costs and optimizing the wafer-slicing process. The DSS20M also produces more than twice the amount of high grade wafers than the DSS850. In short, GT Advanced Technologies is committed to delivering sustained value to customers and the DSS20M delivers on this promise.

Key Product Advantages:

  • Furnace Output > 20 MW per year (assumes 18% efficiency from 156 mm cell lines)
  • Produces the most kilogram of silicon per hour per square meter of floor space
  • Mass ingot yield (MIY): 67 - 78%*
  • Cycle time: 75 - 90 hours*
  • Multi zone control of hot zone
  • Bottom-load process chamber: adds operating convenience
  • Automated and guaranteed process
  • Patent pending safety enhancements
  • Lowest cost of ownership
  • >3,700 systems of experience ensures trouble-free production ramp

* Application Dependent 

Learn more: DSS™ 20M